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  • 专利标题:   Manufacture of graphene used for e.g. transistor, involves adding substrate to reaction chamber, vacuumizing, introducing inert gas, maintaining oxygen-free atmosphere, generating plasma and introducing organic gas and inert gas.
  • 专利号:   CN103101907-A, CN103101907-B
  • 发明人:   WANG Y, YUAN X, ZHOU M
  • 专利权人:   OCEAN KING LIGHTING SCI TECHNOLOGY, HAIYANGWANG LIGHTING TECHNOLOGY CO LTD, OCEANS KING LIGHTING SCI TECHNOLOGY CO, SHENZHEN OCEANS KING LIGHTING SCI TECH
  • 国际专利分类:   B82Y040/00, C01B031/04
  • 专利详细信息:   CN103101907-A 15 May 2013 C01B-031/04 201370 Pages: 8 Chinese
  • 申请详细信息:   CN103101907-A CN10361135 15 Nov 2011
  • 优先权号:   CN10361135

▎ 摘　　要

NOVELTY - A substrate is added to reaction chamber under catalytic action, vacuumized, temperature of the substrate is adjusted to 400-500 degrees C, inert gas is introduced for 1-60 minutes, oxygen-free atmosphere is maintained in reaction chamber, excitation gas is introduced through radio-frequency glow discharge to generated plasma, 10-200 sccm organic gas is introduced and inert gas is introduced at 10-50 sccm/minute for 1-300 minutes, to obtain graphene. USE - Manufacture of graphene used for transistor, electrode material, liquid crystal display material and sensor (all claimed). ADVANTAGE - The method provides has high specific surface area.