• 专利标题:   Processing central supporting rod useful for vapor deposition coating device by making ceramic material in rod body, installing supporting cap, mixing polyvinyl alcohol, water in glue, solidifying isolation in contact layer, applying glue on supporting cap, inserting locating rod in locating hole.
  • 专利号:   CN115650772-A
  • 发明人:   LIU W
  • 专利权人:   SHANGHAI TUOSAI SEMICONDUCTOR MATERIALS CO LTD
  • 国际专利分类:   C04B041/88, C09J011/04, C09J011/06, C09J129/04, C09J131/04, C23C016/458, C23C016/50
  • 专利详细信息:   CN115650772-A 31 Jan 2023 C04B-041/88 202318 Chinese
  • 申请详细信息:   CN115650772-A CN11347562 31 Oct 2022
  • 优先权号:   CN11347562

▎ 摘  要

NOVELTY - Processing central supporting rod comprises (a) making the ceramic material in a rod body (100) and forming a locating hole on inner wall of rod body, (b) making the ceramic material into a supporting cap (200), installing a locating rod on the supporting cap, (c) making the ceramic material into a supporting plate, (d) mixing graphene, glass silver-plated, aluminum silver-plated, silver, titanium, titanium alloy, silicon nitride, boron phosphide and silicon carbide to isolation liquid, (e) mixing polyvinyl alcohol, white latex, sodium stearate, talc powder, urea, ethylene glycol, sucrose, flavor and water into glue, (f) soaking the supporting plate in the isolation liquid, solidifying the isolation liquid wrapped on supporting plate in a contact layer (600), (g) applying glue on the surface of end of supporting cap away from the locating rod, installing to realize the supporting plate on supporting cap and (h) inserting the locating rod into locating hole to obtain supporting rod. USE - The supporting rod is useful for vapor deposition coating device (claimed). ADVANTAGE - The method: avoids the influence of the product performance; has low adhesion and temperature resistance; reduces the problem of impurity particles when the contact layer is in contact with the glass substrate and avoids affecting the quality of the product. DETAILED DESCRIPTION - Processing central supporting rod comprises (a) making the ceramic material into a rod body (100) and forming a locating hole on the inner wall of the rod body by a punching machine, (b) making the ceramic material into a supporting cap (200) and installing a locating rod on the supporting cap by welding, (c) making the ceramic material into a supporting plate, (d) mixing graphene, glass silver-plated, aluminum silver-plated, silver, titanium, titanium alloy, silicon nitride, boron phosphide and silicon carbide into an isolation liquid, (e) mixing polyvinyl alcohol, white latex, sodium stearate, talc powder, urea, ethylene glycol, sucrose, flavor and water into glue, (f) soaking the supporting plate in the isolation liquid, taking out the supporting plate after soaking completely and cooling, solidifying the isolation liquid wrapped on the supporting plate into a contact layer (600), where to realize forming contact layer on the outer surface of the supporting plate, (g) applying glue evenly on the surface of the end of the supporting cap away from the locating rod and making the end of the supporting cap coated with glue contact with the supporting plate, the supporting cap and extruding the supporting cap and the supporting plate with each other, solidifying until the glue, installing to realize the supporting plate on the supporting cap and (h) inserting the locating rod into the locating hole to obtain the supporting rod. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the processing central supporting rod for vapor deposition coating device. 100Rod body 200Supporting cap 600Contact layer