▎ 摘　　要

NOVELTY - Preparing double-halogen atom doped graphene involves using graphite material as a working electrode and platinum as a counter electrode, mixing sulfuric acid and halogen ammonium salt in a mixed solution, peeling the graphite materials using constant voltage technology, washing the solution after electrochemical peeling, ultrasonic and allowing to stand, freezing and drying the upper layer clear liquid to obtain a dual-halon-doped graphene. USE - The method is useful for preparing double-halogen atom doped graphene, which is useful in electronic applications. ADVANTAGE - The method uses green simple and mild condition to prepare high quality of double-halogen atom doped graphene avoids the use of dangerous reagent in the traditional heteroatomic doped graphite method, the preparation cost is low, the technique is simple, it can realize fast, direct, and high-efficiency preparation, has expandability, convenient for mass production, and the product has rich pore and structure defect, large edge size, which is good for obtaining more excellent performance, is fast, directly, high yield, low raw material cost, and has good universality, halogen atom doping type and content can be adjusted and controllable.