▎ 摘　　要

NOVELTY - Forming graphene device involves providing a glass substrate with a blocking layer set to form a stack and a first electrode and a second electrode; increasing the temperature of the stack to l00 degrees C; applying an external electric potential (Vp2) to the first electrode such that one metal ion of the glass substrate migrates toward the first electrode to create a depletion region in the glass substrate adjacent the second electrode at a potential (VPI); decreasing the temperature of the stack to room temperature while applying the external electric potential; and after reaching room temperature, setting the external electric potential to zero to create a frozen voltage region adjacent the second electrode. USE - Method for forming graphene device. ADVANTAGE - The method enables to form graphene device, which ensures graphene doping by thermal poling.