• 专利标题:   New thiazine oligomer used in graphene polishing dispersion for photosensitive composition used for lithographically coating sheet and linear substrate.
  • 专利号:   CN108610305-A
  • 发明人:   GAO Z, QIU W, REN G, ZHONG M, LIAO J, LEI L
  • 专利权人:   SHENZHEN GRAHOPE TECHNOLOGY CO LTD
  • 国际专利分类:   C07D279/06, C07D417/12, G03F007/004, G03F007/027
  • 专利详细信息:   CN108610305-A 02 Oct 2018 C07D-279/06 201901 Pages: 20 Chinese
  • 申请详细信息:   CN108610305-A CN10195722 09 Mar 2018
  • 优先权号:   CN10195722

▎ 摘  要

NOVELTY - A thiazine oligomer (I) is new. USE - New thiazine oligomer used in graphene polishing dispersion for photosensitive composition used for lithographically coating sheet and linear substrate (all claimed). ADVANTAGE - The thiazine oligomer has excellent stability and anti-corrosive effect. DETAILED DESCRIPTION - A thiazine oligomer of formula (I) is new. R1,R2 = Me or H; R3 = linear alkyl, aryl, alkyl-derived group, or aryl-derived group;and n = 1 or 2. INDEPENDENT CLAIMS are included for the following: (1) manufacture of oligomer (I); (2) graphene polishing dispersion, which comprises 3-5 pts. wt. graphene molecular crystals and 5-20 pts. wt. thiazine oligomer (I), in weight ratio of 1:(0.25-5); and (3) photosensitive composition, which contains 10-20 pts. wt. graphene grinding dispersion, 10-30 pts. wt. photocrosslinking monomer, 10-30 pts. wt. epoxy acrylic copolymer, 0.1-3 pts. wt. additive, and 70-90 pts. wt. solvent (s2).