▎ 摘　　要

NOVELTY - The method involves forming (S101) a graphene layer on a metal catalytic substrate, forming (S102) a mask pattern on the metal catalytic substrate using a patterning process, etching (S103) the graphene layer on the metal catalytic substrate using the mask pattern as mask, removing (S104) residuals from the metal catalyst substrates. The graphene layer is formed on substrate by chemical vapor deposition. The mask pattern is patterened using dry etching process. USE - The method is useful for preparing the display substrate (claimed). ADVANTAGE - The residuals from the metal catalyst substrates are removed effectively and the direct contact of resist and graphene layer is prevented, so that contamination of the graphene layer is reduced, conductivity of graphene layer is improved and quality of the display substrate is increased. DETAILED DESCRIPTION - The residuals are removed from the metal catalyst substrates by stripping remaining photoresist of the metal catalyst from the substrate, using wet etching process. The patterning of substrate is carried out by coating propidium iodide solution on the metal catalytic substrate and then thermally curing. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating the method for preparing the display substrate. Step for forming a graphene layer on a metal catalytic substrate (S101) Step for forming a mask pattern on the metal catalytic substrate using a patterning process (S102) Step for etching the graphene layer on the metal catalytic substrate using the mask pattern as mask (S103) Step for removing residuals (S104)