• 专利标题:   Graphene preparing device includes graphene reaction chamber provided with reactant-bearing heating plate and electric field generating device, plasma chamber provided with magnetic field generating device, and plasma jet orifice.
  • 专利号:   CN110872116-A
  • 发明人:   DAI L, LI B, WU C, HE Y, ZHAO G, LI L, MENG Y
  • 专利权人:   ENN SCI TECHNOLOGY DEV CO LTD
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN110872116-A 10 Mar 2020 C01B-032/184 202028 Pages: 9 Chinese
  • 申请详细信息:   CN110872116-A CN11026678 04 Sep 2018
  • 优先权号:   CN11026678

▎ 摘  要

NOVELTY - A graphene preparing device comprises graphene reaction chamber (6) provided with reactant-bearing heating plate (5) and electric field generating device; plasma chamber (10) arranged on one side of graphene reaction chamber, and provided with magnetic field generating device; and plasma jet orifice (1) located at one end of plasma chamber for injecting mixed plasma. The injection direction of mixed plasma is same as extending direction of reactant. The direction of accelerating electric field generated by electric field generating device, direction of screening magnetic field generated by magnetic field generating device and extension direction of reactants are perpendicular to each other. USE - Graphene preparing device. ADVANTAGE - The device uses screening magnetic field to screen argon ion and hydrogen ion, thus avoiding argon ion bombardment and etching effect of graphene oxide. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a method for preparing graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the graphene preparing device. Plasma jet orifice (1) Reactant (4) Reactant-bearing heating plate (5) Graphene reaction chamber (6) Plasma chamber (10)