• 专利标题:   Substrate manufacture method for nitride single crystal growth, involves forming graphene layer on substrate and forming silicon carbide layer on graphene layer.
  • 专利号:   KR2012029278-A
  • 发明人:   SEONG H K, HWANG S W, SONE C S
  • 专利权人:   SAMSUNG LED CO LTD
  • 国际专利分类:   C30B029/38, H01L021/20, H01L021/205
  • 专利详细信息:   KR2012029278-A 26 Mar 2012 H01L-021/20 201313 Pages: 20
  • 申请详细信息:   KR2012029278-A KR091274 16 Sep 2010
  • 优先权号:   KR091274

▎ 摘  要

NOVELTY - The method involves preparing silicon component substrate. The graphene layer is formed on substrate. A silicon carbide layer is formed on the graphene layer. USE - Substrate manufacture method for nitride single crystal growth. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) method of fabricating nitride compound semiconductor luminance device; and (2) nitride semiconductor light emitting diode. DESCRIPTION OF DRAWING(S) - The drawing shows the sectional views illustrating the substrate manufacture method.(Drawing includes non-English language text)