▎ 摘　　要

NOVELTY - The preparation of fluorinated graphite/graphene heterojunction involves placing multi-layer graphene samples in a sample delivery indoor of deep reactive etching machine, sending samples to pumping chamber with pressure of less than or equal to 10-3 Torr, placing multi-graphene sample in reaction chamber, evacuating pressure inside the reaction chamber to less than or equal to 10-6 Torr, feeding sulfur hexafluoride gas at flow rate of 100 sccm, performing plasma excitation of sulfur hexafluoride, reacting at ionization power of 10-300 W for 5 seconds to 20 minutes, and removing sample. USE - Preparation of fluorinated graphite/graphene heterojunction used in graphene heterojunction device. ADVANTAGE - The method enables preparation of fluorinated graphite/graphene heterojunction with excellent controllability, and is economical.