• 专利标题:   Method for modulating exciton resonance absorption of two-dimensional semiconductor material, involves determining photo-generated carrier in graphene, and adjusting exciton resonance absorption intensity.
  • 专利号:   CN115207162-A
  • 发明人:   WANG H, GAO T, REN J, LIU Y, YAO P
  • 专利权人:   BEIJING COMPUTER TECHNOLOGY APPL RES
  • 国际专利分类:   H01L031/028, H01L031/032, H01L031/074, H01L031/109, H01L031/18
  • 专利详细信息:   CN115207162-A 18 Oct 2022 H01L-031/18 202296 Chinese
  • 申请详细信息:   CN115207162-A CN10851392 19 Jul 2022
  • 优先权号:   CN10851392

▎ 摘  要

NOVELTY - The method involves selecting crystal material. A heat-conducting adhesive tape is cut into two rectangular shapes. The crystal is placed between two adhesive surfaces of the heat-conducting adhesive tape. Large amount of layered two-dimensional crystal material is placed on the adhesive surface of the heat-conducting adhesive tape. A PDMS substrate with graphene is taken. A photo-generated carrier in the graphene is injected. A photo-generated carrier in the graphene is determined under a condition of the graphene. Exciton resonance absorption intensity of the tungsten disulfide is adjusted. USE - Method for modulating exciton resonance absorption of two-dimensional semiconductor material by graphene layer thickness. ADVANTAGE - The method enables improving photoelectric conversion rate, so as to improve device performance, and realizing the exciton resonance absorption intensity of the 2D semiconductor materials by changing the layer thickness of graphene. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of a two-dimensional semiconductor material (Drawing includes non-English language text).