▎ 摘　　要

NOVELTY - Preparing photosensitive nanoparticle involves mixing graphene oxide, cyclodextrin, azobenzene and sesquipolysiloxane, and the cyclodextrin and graphene oxide and reacting to obtain cyclodextrin modified graphene oxide, where cyclodextrin and graphene oxide in mass ratio of 20-1:1. The azobenzene and sesquipolysiloxane reaction to obtain azobenzene functional sesquipolysiloxane, where sesquipolysiloxane and azobenzene molar ratio of 2:1-3. The cyclodextrin-modified graphene oxide and the azobenzene-functional sesquipolysiloxane are coupled to form photosensitive nanoparticles. USE - Method for preparing photosensitive nanoparticle. ADVANTAGE - The method enables to prepare photosensitive nanoparticle, which effectively controlled barrier permeability under light conditions. DETAILED DESCRIPTION - Preparing photosensitive nanoparticle involves mixing graphene oxide, cyclodextrin, azobenzene and sesquipolysiloxane, and the cyclodextrin and graphene oxide and reacting to obtain cyclodextrin modified graphene oxide, where cyclodextrin and graphene oxide in mass ratio of 20-1:1. The azobenzene and sesquipolysiloxane reaction to obtain azobenzene functional sesquipolysiloxane, where sesquipolysiloxane and azobenzene molar ratio of 2:1-3. The cyclodextrin-modified graphene oxide and the azobenzene-functional sesquipolysiloxane are coupled to form photosensitive nanoparticles, where cyclodextrin-modified graphene oxide and the azobenzene-functional sesquipolysiloxane in mass ratio of 5:1-25.