▎ 摘　　要

NOVELTY - The method involves stirring the silver nanowire dispersion liquid with the substrate with the photoresist model. The primary silver nanowire treatment is carried out on the substrate to prepare silver nanowires on the substrate which is not covered by the photoresist. The substrate subjected to the primary silver nanowire treatment is rotated by a preset angle. The silver nanowire dispersion liquid is stirred. The secondary silver nanowire treatment is performed on the substrate to prepare silver nanowires on the substrate. The silver nanowire layer is irradiated to weld crossed silver nanowires at the crossed positions. The graphene layer is transferred to the surfaces of the silver nanowire layer and the photoresist layer to form a film. The post-treatment is performed on the film to remove the photoresist layer and the graphene on the photoresist layer. USE - Method for patterning composite conductive film (claimed). ADVANTAGE - The patterning method enables the silver nanowires to be orderly arranged in a required direction. The structure of the silver nanowire layer is properly patterned, which ensures that the silver nanowires and the graphene have a good lap joint structure. The conductivity of the composite film is improved. The composite film has good light transmittance. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for a composite conductive film. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of a vertically crossing layer of silver nanowire provided in the method for patterning composite conductive film.