• 专利标题:   Manufacture of functional graphene used in semiconductor device, involves mixing carbon-based material, acid comprising amine group and carboxyl group, acetic acid and solvent, raising temperature and stirring, and cooling resultant of stirring.
  • 专利号:   KR2022112100-A
  • 发明人:   KIM J, SONG J
  • 专利权人:   FINE LAB CO LTD
  • 国际专利分类:   C01B032/156, C01B032/184, C01B032/215
  • 专利详细信息:   KR2022112100-A 10 Aug 2022 C01B-032/184 202269 Pages: 10
  • 申请详细信息:   KR2022112100-A KR015663 03 Feb 2021
  • 优先权号:   KR015663

▎ 摘  要

NOVELTY - Manufacture of functional graphene involves (a) mixing a carbon-based material, an acid comprising both an amine group and a carboxyl group, acetic acid and a solvent, (b) raising the temperature of the resultant of the mixing step and stirring for at least 8 hours, and (c) cooling the resultant of the stirring step. USE - Manufacture of functional graphene used in semiconductor device, display device, and battery device. ADVANTAGE - The method prevents aggregation of graphene by including acetic acid together with an acid comprising both an amine group and a carboxyl group.