• 专利标题:   Preparing reduced graphene oxide by dielectric barrier discharge plasma comprises placing graphene oxide between two electrodes in a plasma device, applying high voltage on the two electrodes and carrying out plasma treatment.
  • 专利号:   CN107686108-A
  • 发明人:   WANG Z, PENG X, HOU B, HAO H, GONG J, WANG Y, BAO Y, ZHANG M, YIN Q
  • 专利权人:   UNIV TIANJIN
  • 国际专利分类:   C01B032/184
  • 专利详细信息:   CN107686108-A 13 Feb 2018 C01B-032/184 201817 Pages: 9 Chinese
  • 申请详细信息:   CN107686108-A CN10855342 20 Sep 2017
  • 优先权号:   CN10855342

▎ 摘  要

NOVELTY - Preparing reduced graphene oxide by dielectric barrier discharge plasma comprises (i) placing graphene oxide between two electrodes in a plasma device, (ii) passing discharge gas into plasma device, (iii) applying high voltage on the two electrodes, and carrying out plasma treatment to obtain final product. USE - The method is useful for preparing reduced graphene oxide by dielectric barrier discharge plasma. ADVANTAGE - The method has convenient operation, low energy consumption, no pollution, high production efficiency, utilizes simple device, (carbon source conversion rate reaches more than 90%), and increases the specific surface area from 100 m2 g to 400 m2/g of the reduction method, and low preparation cost; and is suitable for industrial production.