• 专利标题:   Graphene semiconductor design method using Doppler effect, involves integrating graphene semiconductor by generating surface plasmon resonance phenomenon by changing feeding direction of plasmon medium to form metamaterial.
  • 专利号:   KR2017093750-A, WO2018143532-A1, KR1968942-B1
  • 发明人:   MEE J K, KIM M J, JEONG K M
  • 专利权人:   KIM M J, JEONG K M
  • 国际专利分类:   C01B032/182, H01L021/02, H01L029/06, H01L029/16, H01L029/66, C01B032/20
  • 专利详细信息:   KR2017093750-A 16 Aug 2017 H01L-029/16 201765 Pages: 8
  • 申请详细信息:   KR2017093750-A KR016392 06 Feb 2017
  • 优先权号:   KR015109, KR016392

▎ 摘  要

NOVELTY - The method involves designing graphene semiconductor by varying the angular frequency and the effective dielectric constant of the plasmon medium with a resonator. The graphene semiconductor is integrated by generating a surface plasmon resonance phenomenon by changing a feeding direction of the plasmon medium to form a metamaterial. The graphene plasmon medium acts as an insulator when the effective permittivity of the graphene plasmon medium becomes high. USE - Graphene semiconductor design method using Doppler effect and plasmon resonance. ADVANTAGE - The graphene semiconductors can be integrated by applying surface plasmon resonance phenomenon. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating the graphene semiconductor design method. (Drawing includes non-English language text)