• 专利标题:   Polymer nanomesh used for preparation of graphene nanomesh, has planar structure having cyclized nanomesh-forming polymer and two-dimensional holes arranged on planar structure.
  • 专利号:   US2016297681-A1
  • 发明人:   JOH H, SON S Y, LEE S H, KIM T
  • 专利权人:   KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   C01B031/04, C08J009/26, C09D005/24, C23C014/06, C23C016/26, H01B001/04
  • 专利详细信息:   US2016297681-A1 13 Oct 2016 C01B-031/04 201672 Pages: 18 English
  • 申请详细信息:   US2016297681-A1 US183282 15 Jun 2016
  • 优先权号:   KR014836

▎ 摘  要

NOVELTY - A polymer nanomesh has a planar structure having a cyclized nanomesh-forming polymer and two-dimensional holes arranged on the planar structure. USE - Polymer nanomesh is used for preparation of graphene nanomesh (claimed). ADVANTAGE - The polymer nanomesh is prepared by a simple process with high reproducibility in large scale and can easily control the band gap of the carbon nanomesh. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) carbon nanomesh having a cyclic structure of carbon atoms and two-dimensional holes arranged on the planar structure. The cyclic structure of carbon atoms comes from carbonization of a cyclized nano-mesh forming polymer; and (2) preparation of a graphene nanomesh, which involves preparing a polymer nanofilm by coating a solution of a block copolymer of a pore-forming polymer and nanomesh-forming polymer or by coating a solution of a polymer mixture of a pore-forming polymer and a nanomesh-forming polymer on a substrate, stabilizing the polymer nanofilm, removing pore-forming polymer and cyclizing the nanomesh-forming polymer to form a stabilized polymer nanomesh with pores and carbonizing the stabilized polymer nanomesh with pores to prepare a graphene nanomesh. DESCRIPTION OF DRAWING(S) - The drawing shows an exemplary view of a preparation process of graphene nanomesh.