• 专利标题:   Labeling of defects in graphene layer for graphene film production involves providing substrate with surface partially covered by graphene layer and contacting substrate with indicator which selectively binds with areas exposed by defects.
  • 专利号:   WO2014171946-A1, US2015079683-A1, TW201502497-A, TW489099-B1, CN105122044-A, US9297768-B2, CN105122044-B
  • 发明人:   YAGER T A, MILLER S A
  • 专利权人:   EMPIRE TECHNOLOGY DEV LLC, ISLAND GIANT DEV LLP
  • 国际专利分类:   G01N021/91, G01N021/64, G01N021/77, G01N021/84, G01N021/88, C09K011/06
  • 专利详细信息:   WO2014171946-A1 23 Oct 2014 G01N-021/91 201475 Pages: 44 English
  • 申请详细信息:   WO2014171946-A1 WOUS037175 18 Apr 2013
  • 优先权号:   CN80075719, WOUS037175, US14118006

▎ 摘  要

NOVELTY - Defects in graphene layer are labeled by providing substrate with surface partially covered by graphene layer and contacting substrate with indicator which selectively binds with greater than or equal to 1 areas exposed by defects in the graphene layer. USE - Labeling of defects in graphene layer for high volume and/or large area production of graphene films. ADVANTAGE - The systems and kits can provide a fast and effective way of checking for defects and/or labeling defects in the graphene layer, improving process control and quality assurance during production and handling of graphene films. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for: (1) system for labeling defects in a graphene layer comprising substrate having a surface at least partially covered by graphene layer and 1st reservoir containing a solution of an indicator which selectively binds with greater than or equal to 1 areas of the surface exposed by the defects to label the defects and configured to contact the substrate with the solution of the indicator; (2) inspection of graphene layer for defects which involves providing substrate having a surface at least partially covered by graphene layer, contacting substrate with fluorophore which selectively binds with greater than or equal to 1 areas of the surface exposed by the defects in the graphene layer to label locations of the defects, exposing substrate to radiation effective to generate a detectable fluorescence response from the fluorophore at greater than or equal to 1 areas of the surface exposed by the defects, and monitoring the fluorescence response of the fluorophore; (3) system for inspecting graphene layer for defects comprising substrate having a surface at least partially covered by graphene layer, 1st reservoir containing solution of fluorophore which selectively binds with greater than or equal to 1 areas of the surface exposed by the defects and configured to contact the substrate with the solution of the fluorophore, radiation source configured to irradiate the substrate to generate a detectable fluorescence response from the fluorophore at greater than or equal to 1 areas of the surface exposed by the defects, and detector configured to monitor the fluorescence response of the fluorophore; (4) kit for labeling defects in a graphene layer on surface of a substrate comprising a fluorophore which selectively binds with greater than or equal to 1 areas of the surface exposed by the defects in the graphene layer to label the defects and a set of instructions for contacting the substrate with a solution of the fluorophore; (5) labeled sample comprising substrate having a surface at least partially covered by a graphene layer and fluorophore at greater than or equal to 1 areas of the surface exposed by the defects in the graphene layer to label the defects; and (6) pretreated sample comprising substrate having a surface at least partially covered by graphene layer and amino silane at greater than or equal to 1 areas of the surface exposed by the defects in the graphene layer to pretreat the greater than or equal to 1 of the surface for binding with a fluorophore. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the labeling of a surface of a substrate exposed by a defect in the graphene layer using a silane fluorophore.