国家/地区 France（5）
关键词 GRAPHENE（2） PHOTOELECTRON SPECT.（2） PHOTOEMISSION ELECT.（2）
出版物 JOURNAL OF APPLIED .（2）
出版时间 2018（2）
机构 UNIV GRENOBL.（2）
作者 FERRAH D（6）

CF4/H-2 Plasma Cleaning of Graphene Regenerates Electronic Properties of the Pristine Material

ACS APPLIED NANO MATERIALS

FERRAH D, RENAULT O, MARINOV D, ARIASZAPATA J, CHEVALIER N, MARIOLLE D, ROUCHON D, OKUNO H, BOUCHIAT V, CUNGE G

High density H-2 and He plasmas: Can they be used to treat graphene?

JOURNAL OF APPLIED PHYSICS

MEHEDI HA, FERRAH D, DUBOIS J, PETITETIENNE C, OKUNO H, BOUCHIAT V, RENAULT O, CUNGE G

Effective patterning and cleaning of graphene by plasma etching and block copolymer lithography for nanoribbon fabrication

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

ARIASZAPATA J, FERRAH D, MEHEDI HA, CUNGE G, ZELSMANN M

X-ray photoelectron spectroscopy (XPS) and diffraction (XPD) study of a few layers of graphene on 6H-SiC(0001)

SURFACE SCIENCE

FERRAH D, PENUELAS J, BOTTELA C, GRENET G, OUERGHI A

XPS investigations of graphene surface cleaning using H-2- and Cl-2-based inductively coupled plasma

SURFACE INTERFACE ANALYSIS

FERRAH D, RENAULT O, PETITETIENNE C, OKUNO H, BERNE C, BOUCHIAT V, CUNGE G

Dry efficient cleaning of poly-methyl-methacrylate residues from graphene with high-density H-2 and H-2-N-2 plasmas

JOURNAL OF APPLIED PHYSICS

CUNGE G, FERRAH D, PETITETIENNE C, DAVYDOVA A, OKUNO H, KALITA D, BOUCHIAT V, RENAULT O