国家/地区
关键词 CHEMICAL VAPOR DEPOSITION（2）
出版物
出版时间
机构
作者 HALLAM T（2）

Nitrogen as a Suitable Replacement for Argon within Methane-Based Hot-Wall Graphene Chemical Vapor Deposition

PHYSICA STATUS SOLIDI BBASIC SOLID STATE PHYSICS

GAUSDEN J, SIRIS R, STIMPELLINDNER T, MCEVOY N, DUESBERG GS, HALLAM T

Field Emission Characteristics of Contact Printed Graphene Fins

SMALL

HALLAM T, COLE MT, MILNE WI, DUESBERG GS