APL PHOTONICS
KWON MG, KIM C, CHANG KE, YOO TJ, KIM SY, HWANG HJ, LEE S, LEE BH
NPG ASIA MATERIALS
SINGH AK, AHN K, YOO D, LEE S, ALI A, YI GC, CHUNG K
ADVANCED OPTICAL MATERIALS
SAROJ RK, GUHA P, LEE S, YOO D, LEE E, LEE J, KIM M, YI GC
ADDITIVE MANUFACTURING
WAJAHAT M, LEE S, KIM JH, AHN J, SIM HH, KIM JH, BAE J, KIM SH, PYO J, SEOL SK
ADVANCED ELECTRONIC MATERIALS
LEE S, CHOI H, MOON I, SHIN H, WATANABE K, TANIGUCHI T, YOO WJ
ACS NANO
KWON B, BAE H, LEE H, KIM S, HWANG J, LIM H, LEE JH, CHO K, YE J, LEE S, LEE WH
CELLULOSE
CHEONG D, LEE SW, PARK I, JUNG HG, ROH S, LEE D, LEE T, LEE S, LEE W, YOON DS, LEE G
MICROCHIMICA ACTA
LEE J, NA HK, LEE S, KIM WK
Stress Relaxation Behavior of Poly(Methyl Methacrylate)/Graphene Composites: Ultraviolet Irradiation
POLYMERS
JU YC, CHIANG D, TSAI MY, OUYANG H, LEE S
CATALYSTS
KIM J, LIM J, KIM JD, CHOI MY, LEE S, CHOI HC