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关键词
出版物 APPLIED PHYSICS LETTERS（2）
出版时间
机构
作者 PARK SY（2）

Alleviation of fermi-level pinning effect at metal/germanium interface by the insertion of graphene layers

APPLIED PHYSICS LETTERS

BAEK SHC, SEO YJ, OH JG, PARK MGA, BONG JH, YOON SJ, SEO M, PARK SY, PARK BG, LEE SH

Conformal Al2O3 dielectric layer deposited by atomic layer deposition for graphene-based nanoelectronics

APPLIED PHYSICS LETTERS

LEE BK, PARK SY, KIM HC, CHO K, VOGEL EM, KIM MJ, WALLACE RM, KIM JY