国家/地区 Korea（5）
关键词
出版物 APPLIED PHYSICS LET.（2）
出版时间 2014（2） 2015（2）
机构 SUNGKYUNKWAN.（5）
作者 RA CH（5）

Reduction of metal contact resistance of graphene devices via CO2 cluster cleaning

APPLIED PHYSICS LETTERS

GAHNG S, RA CH, CHO YJ, KIM JA, KIM T, YOO WJ

High performance vertical tunneling diodes using graphene/hexagonal boron nitride/graphene hetero-structure

APPLIED PHYSICS LETTERS

LEE SH, CHOI MS, LEE J, RA CH, LIU X, HWANG E, CHOI JH, ZHONG JQ, CHEN W, YOO WJ

Si-Compatible Cleaning Process for Graphene Using Low-Density Inductively Coupled Plasma

ACS NANO

LIM YD, LEE DY, SHEN TZ, RA CH, CHOI JY, YOO WJ

Edge contacts of graphene formed by using a controlled plasma treatment

NANOSCALE

YUE DW, RA CH, LIU XC, LEE DY, YOO WJ

High-Performance Perovskite-Graphene Hybrid Photodetector

ADVANCED MATERIALS

LEE Y, KWON J, HWANG E, RA CH, YOO WJ, AHN JH, PARK JH, CHO JH