国家/地区 Germany(9) China(2) England(2)
关键词 GRAPHENE(7) PHOTOELECTRON SPECT.(3) METALSUPPORT INTERA.(2)
PALLADIUM NANOPARTI.(2)
出版物 ANGEWANDTE CHEMIEIN.(3) CHEMSUSCHEM(2) NANO LETTERS(2)
出版时间 2012(3) 2014(2) 2015(2)
机构 MAX PLANCK G.(3) CHINESE ACAD.(2) MAX PLANCK I.(2) UNIV CAMBRID.(2)
作者 SCHLOGL R(15)

ACS APPLIED MATERIALS INTERFACES

FALLING LJ, MOM RV, DIAZ LES, NAKHAIE S, STOTZ E, IVANOV D, HAVECKER M, LUNKENBEIN T, KNOPGERICKE A, SCHLOGL R, VELASCOVELEZ JJ

SURFACE SCIENCE

VELASCOVELEZ JJ, JONES TE, STREIBEL V, HAVECKER M, CHUANG CH, FREVEL L, PLODINEC M, CENTENO A, ZURUTUZA A, WANG R, ARRIGO R, MOM R, HOFMANN S, SCHLOGL R, KNOPGERICKE A

ANGEWANDTE CHEMIEINTERNATIONAL EDITION

WEN GD, GU QQ, LIU YF, SCHLOGL R, WANG CX, TIAN ZJ, SU DS

JOURNAL OF PHYSICAL CHEMISTRY LETTERS

MONACHINO E, GREINER M, KNOPGERICKE A, SCHLOGL R, DRI C, VESSELLI E, COMELLI G

PHYSICAL CHEMISTRY CHEMICAL PHYSICS

BLUME R, KIDAMBI PR, BAYER BC, WEATHERUP RS, WANG ZJ, WEINBERG G, WILLINGER MG, GREINER M, HOFMANN S, KNOPGERICKE A, SCHLOGL R

CHEMICAL COMMUNICATIONS

ARTYUSHKOVA K, KIEFER B, HALEVI B, KNOPGERICKE A, SCHLOGL R, ATANASSOV P

CHEMPHYSCHEM

WEATHERUP RS, BAYER BC, BLUME R, BAEHTZ C, KIDAMBI PR, FOUQUET M, WIRTH CT, SCHLOGL R, HOFMANN S

JOURNAL OF MATERIALS CHEMISTRY

CHEN CM, ZHANG Q, ZHAO XC, ZHANG BS, KONG QQ, YANG MG, YANG QH, WANG MZ, YANG YG, SCHLOGL R, SU DS

NANO LETTERS

WEATHERUP RS, BAYER BC, BLUME R, DUCATI C, BAEHTZ C, SCHLOGL R, HOFMANN S