国家/地区 Korea（2）
关键词 CONTACT RESISTANCE（2）
出版物
出版时间
机构
作者 YU HY（2）

Extremely Low Contact Resistance on Graphene through n-Type Doping and Edge Contact Design

ADVANCED MATERIALS

PARK HY, JUNG WS, KANG DH, JEON J, YOO G, PARK Y, LEE J, JANG YH, LEE J, PARK S, YU HY, SHIN B, LEE S, PARK JH

Effective Schottky barrier height and interface trap density reduction engineering using 2-dimensional reduced graphene oxide interlayer for metal-interlayer-semiconductor contact structure

JOURNAL OF ALLOYS COMPOUNDS

SONG S, KIM SH, KIM SG, HAN KH, KIM HJ, YU HY