国家/地区
关键词 ETCHING（2）
出版物 JOURNAL OF ELECTRONIC MATERIALS（2）
出版时间
机构
作者

Re-nucleation and Etching of Graphene During the Cooling Stage of Chemical Vapor Deposition

JOURNAL OF ELECTRONIC MATERIALS

LIANG YJ, ZHANG YH, CHEN ZY, GE XM, HU SK, LI J, SUI YP, YU GH

SiC Homoepitaxy, Etching and Graphene Epitaxial Growth on SiC Substrates Using a Novel Fluorinated Si Precursor Gas (SiF4)

JOURNAL OF ELECTRONIC MATERIALS

RANA T, CHANDRASHEKHAR MVS, DANIELS K, SUDARSHAN T