国家/地区 | Taiwan(2) |
关键词 | LOW VACUUM ANNEALING(3) |
出版物 | |
出版时间 | |
机构 | |
作者 |
NGUYEN DD(3)
HOFMANN M(2)
HSIEH YP(2)
HSU CC(2)
KAN HC(2) |
ACS APPLIED NANO MATERIALS
TRAN VV, NGUYEN DD, NGUYEN AT, HOFMANN M, HSIEH YP, KAN HC, HSU CC
ACS APPLIED MATERIALS INTERFACES
NGUYEN DD, TIWARI RN, MATSUOKA Y, HASHIMOTO G, ROKUTA E, CHEN YZ, CHUEH YL, YOSHIMURA M
NANOMATERIALS
TRAN V, NGUYEN DD, HOFMANN M, HSIEH YP, KAN HC, HSU CC