| 国家/地区 |
England（9）
|
| 关键词 | GRAPHENE（4） ATOMIC LAYER DEPOSI.（3） |
| 出版物 | APPLIED PHYSICS LET.（2） |
| 出版时间 | 2017（5） 2016（2） |
| 机构 |
UNIV CAMBRIDGE（9）
|
| 作者 |
ARIA AI（9）
|
APPLIED PHYSICS LETTERS
DI NUZZO D, MIZUTA R, NAKANISHI K, MARTIN MB, ARIA AI, WEATHERUP R, FRIEND RH, HOFMANN S, ALEXANDERWEBBER J
APPLIED PHYSICS LETTERS
CEBO T, ARIA AI, DOLAN JA, WEATHERUP RS, NAKANISHI K, KIDAMBI PR, DIVITINI G, DUCATI C, STEINER U, HOFMANN S
NANOTECHNOLOGY
CABREROVILATELA A, ALEXANDERWEBBER JA, SAGADE AA, ARIA AI, BRAEUNINGERWEIMER P, MARTIN MB, WEATHERUP RS, HOFMANN S
SCIENTIFIC REPORTS
KINDNESS SJ, JESSOP DS, WEI B, WALLIS R, KAMBOJ VS, XIAO L, REN Y, BRAEUNINGERWEIMER P, ARIA AI, HOFMANN S, BEERE HE, RITCHIE DA, DEGL INNOCENTI R
JOURNAL OF PHYSICS DAPPLIED PHYSICS
DEGL INNOCENTI R, XIAO L, KINDNESS SJ, KAMBOJ VS, WEI BB, BRAEUNINGERWEIMER P, NAKANISHI K, ARIA AI, HOFMANN S, BEERE HE, RITCHIE DA
2D MATERIALS
ALEXANDERWEBBER JA, SAGADE AA, ARIA AI, VAN VELDHOVEN ZA, BRAEUNINGERWEIMER P, WANG RZ, CABREROVILATELA A, MARTIN MB, SUI JG, CONNOLLY MR, HOFMANN S
ACS APPLIED MATERIALS INTERFACES
ARIA AI, NAKANISHI K, XIAO L, BRAEUNINGERWEIMER P, SAGADE AA, ALEXANDERWEBBER JA, HOFMANN S
JOURNAL OF PHYSICAL CHEMISTRY C
ARIA AI, KIDAMBI PR, WEATHERUP RS, XIAO L, WILLIAMS JA, HOFMANN S
NANOSCALE
SANDERS S, CABREROVILATELA A, KIDAMBI PR, ALEXANDERWEBBER JA, WEIJTENS C, BRAEUNINGERWEIMER P, ARIA AI, QASIM MM, WILKINSON TD, ROBERTSON J, HOFMANN S, MEYER J