国家/地区 Germany（7）
关键词
出版物 APPLIED PHYSICS LET.（2）
出版时间 2013（2） 2015（2）
机构 IHP（7）
作者 WOLFF A（7）

Processing and integration of graphene in a 200 mm wafer Si technology environment

MICROELECTRONIC ENGINEERING

LISKER M, LUKOSIUS M, FRASCHKE M, KITZMANN J, DABROWSKI J, FURSENKO O, KULSE P, SCHULZ K, KRUGER A, DREWS J, SCHULZE S, WOLANSKY D, SCHUBERT AM, KATZER J, STOLAREK D, COSTINA I, WOLFF A, DZIALLAS G, COCCETTI F, MAI A

Deposition of thin silicon layers on transferred large area graphene

APPLIED PHYSICS LETTERS

LUPINA G, KITZMANN J, LUKOSIUS M, DABROWSKI J, WOLFF A, MEHR W

Nucleation and growth of HfO2 layers on graphene by chemical vapor deposition

APPLIED PHYSICS LETTERS

LUPINA G, LUKOSIUS M, KITZMANN J, DABROWSKI J, WOLFF A, MEHR W

Graphene Synthesis and Processing on Ge Substrates

ECS JOURNAL OF SOLID STATE SCIENCE TECHNOLOGY

LUPINA G, LUKOSIUS M, LIPPERT G, DABROWSKI J, KITZMANN J, LISKER M, KULSE P, KRUGER A, FURSENKO O, COSTINA I, TRUSCH A, YAMAMOTO Y, WOLFF A, SCHROEDER T, MAI A

Metal-Free CVD Graphene Synthesis on 200 mm Ge/Si(001) Substrates

ACS APPLIED MATERIALS INTERFACES

LUKOSIUS M, DABROWSKI J, KITZMANN J, FURSENKO O, AKHTAR F, LISKER M, LIPPERT G, SCHULZE S, YAMAMOTO Y, SCHUBERT MA, KRAUSE HM, WOLFF A, MAI A, SCHROEDER T, LUPINA G

Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

ACS NANO

LUPINA G, KITZMANN J, COSTINA I, LUKOSIUS M, WENGER C, WOLFF A, VAZIRI S, OSTLING M, PASTERNAK I, KRAJEWSKA A, STRUPINSKI W, KATARIA S, GAHOI A, LEMME MC, RUHL G, ZOTH G, LUXENHOFER O, MEHR W

Direct growth of HfO2 on graphene by CVD

JOURNAL OF VACUUM SCIENCE TECHNOLOGY B

LUKOSIUS M, DABROWSKI J, WOLFF A, KAISER D, MEHR W, LUPINA G