国家/地区 | Japan(2) |
关键词 | |
出版物 | JOURNAL OF APPLIED PHYSICS(2) |
出版时间 | |
机构 | NAGOYA INST TECHNOL(2) |
作者 | KALITA G(2) |
Fabrication of poly(methyl methacrylate)-MoS2/graphene heterostructure for memory device application
JOURNAL OF APPLIED PHYSICS
SHINDE SM, KALITA G, TANEMURA M
JOURNAL OF APPLIED PHYSICS
KASHID RV, YUSOP MZ, TAKAHASHI C, KALITA G, PANCHAKARLA LS, JOAG DS, MORE MA, TANEMURA M