国家/地区 Japan（2）
关键词 HELIUM ION BEAM MILLING（2）
出版物
出版时间
机构 JAPAN ADV IN.（2）
作者 MURUGANATHAN M（2）

Dielectric-Screening Reduction-Induced Large Transport Gap in Suspended Sub-10 nm Graphene Nanoribbon Functional Devices

SMALL

SCHMIDT ME, MURUGANATHAN M, KANZAKI T, IWASAKI T, HAMMAM AMM, SUZUKI S, OGAWA S, MIZUTA H

Structurally Controlled Large-Area 10 nm Pitch Graphene Nanomesh by Focused Helium Ion Beam Milling

ACS APPLIED MATERIALS INTERFACES

SCHMIDT ME, IWASAKI T, MURUGANATHAN M, HAQUE M, VAN NGOC H, OGAWA S, MIZUTA H