| 国家/地区 |
Japan(2)
|
| 关键词 | |
| 出版物 |
JOURNAL OF APPLIED PHYSICS(2)
|
| 出版时间 | |
| 机构 |
NAGOYA INST TECHNOL(2)
|
| 作者 | KALITA G(2) TANEMURA M(2) |
Fabrication of poly(methyl methacrylate)-MoS2/graphene heterostructure for memory device application
JOURNAL OF APPLIED PHYSICS
SHINDE SM, KALITA G, TANEMURA M
JOURNAL OF APPLIED PHYSICS
KASHID RV, YUSOP MZ, TAKAHASHI C, KALITA G, PANCHAKARLA LS, JOAG DS, MORE MA, TANEMURA M
