国家/地区 Korea（3）
关键词 ATOMIC LAYER DEPOSITION（3）
出版物
出版时间 2016（3）
机构 SAMSUNG ADV .（2）
作者 CHO Y（2） JEON W（2） JEONG SJ（2） LEE MH（2）
LEE Y（2） PARK S（2）

Hydrophobic Surface Treatment and Interrupted Atomic Layer Deposition for Highly Resistive Al2O3 Films on Graphene

ACS APPLIED MATERIALS INTERFACES

JEON JH, JERNG SK, AKBAR K, CHUN SH

Physisorbed-precursor-assisted atomic layer deposition of reliable ultrathin dielectric films on inert graphene surfaces for low-power electronics

2D MATERIALS

JEONG SJ, KIM HW, HEO J, LEE MH, SONG HJ, KU J, LEE Y, CHO Y, JEON W, SUH H, HWANG S, PARK S

Mesostructured HfxAlyO2 Thin Films as Reliable and Robust Gate Dielectrics with Tunable Dielectric Constants for High-Performance Graphene-Based Transistors

ACS Nano

LEE Y, JEON W, CHO Y, LEE MH, JEONG SJ, PARK J, PARK S