国家/地区 Switzerland（3）
关键词
出版物 APPLIED PHYSICS LET.（2）
出版时间
机构 UNIV BASEL（3）
作者 STEINER R（3）

Pure hydrogen low-temperature plasma exposure of HOPG and graphene: Graphane formation?

BEILSTEIN JOURNAL OF NANOTECHNOLOGY

EREN B, HUG D, MAROT L, PAWLAK R, KISIEL M, STEINER R, ZUMBUHL DM, MEYER E

Work function of few layer graphene covered nickel thin films measured with Kelvin probe force microscopy

APPLIED PHYSICS LETTERS

EREN B, GYSIN U, MAROT L, GLATZEL T, STEINER R, MEYER E

Spectroscopic ellipsometry on Si/SiO2/graphene tri-layer system exposed to downstream hydrogen plasma: Effects of hydrogenation and chemical sputtering

APPLIED PHYSICS LETTERS

EREN B, FU WY, MAROT L, CALAME M, STEINER R, MEYER E