国家/地区 | Usa(3) |
关键词 | CONTACT RESISTANCE(3) |
出版物 | APPLIED PHYSICS LET.(2) |
出版时间 | 2010(3) |
机构 | |
作者 |
ACS NANO
BECERRIL HA, STOLTENBERG RM, TANG ML, ROBERTS ME, LIU ZF, CHEN YS, KIM DH, LEE BL, LEE S, BAO ZA
APPLIED PHYSICS LETTERS
FARMER DB, LIN YM, AVOURIS P
APPLIED PHYSICS LETTERS
VENUGOPAL A, COLOMBO L, VOGEL EM