国家/地区 | Usa(2) |
关键词 | HOLEY GRAPHENE OXIDE(2) |
出版物 | |
出版时间 | |
机构 | |
作者 | CHEN XY(2) HUANG L(2) LIN HQ(2) |
ACS APPLIED MATERIALS INTERFACES
CHEN XY, FENG ZH, GOHIL J, STAFFORD CM, DAI N, HUANG L, LIN HQ
CHEMICAL ENGINEERING JOURNAL
CHEN XY, DENG ER, LIN XC, TANDEL AM, RUB D, ZHU LX, HUANG L, LIN HQ