ACS NANO

HE K, ROBERTSON AW, LEE S, YOON E, LEE GD, WARNER JH

CHEMICAL VAPOR DEPOSITION

WANG BB, ZHENG K, CHENG QJ, WANG L, CHEN CC, DONG GB

PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA

ZHAO J, DENG QM, AVDOSHENKO SM, FU L, ECKERT J, RUEMMELI MH

NANO LETTERS

WARNER JH, LIN YC, HE K, KOSHINO M, SUENAGA K

BULLETIN OF THE KOREAN CHEMICAL SOCIETY

AHN S, KANG SM, LEE SH, PARK JB

ACS NANO

ZHAO HM, LIN YC, YEH CH, TIAN H, CHEN YC, XIE D, YANG Y, SUENAGA K, REN TL, CHIU PW

JOURNAL OF RAMAN SPECTROSCOPY

YEH CH, LIN YC, NAYAK PK, LU CC, LIU Z, SUENAGA K, CHIU PW

APPLIED SURFACE SCIENCE

FOGARASSY Z, RUMMELI MH, GORANTLA S, BACHMATIUK A, DOBRIK G, KAMARAS K, BIRO LP, HAVANCSAK K, LABAR JL

CHEMICAL ENGINEERING PROCESSINGPROCESS INTENSIFICATION

DEOSARKAR MP, PAWAR SM, BHANVASE BA

MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING

OH WC, ULLAH K, ZHU L, MENG ZD, YE S, SARKAR S