国家/地区 | England(5) China(3) |
关键词 | GRAPHENE(4) QUANTUM CASCADE LAS.(2) |
出版物 | ACS PHOTONICS(3) ACS APPLIED MATERIA.(2) |
出版时间 | 2016(9) |
机构 | UNIV CAMBRID.(5) |
作者 | XIAO L(9) |
NANOSCALE RESEARCH LETTERS
LIU JK, LI QQ, CHEN M, REN MX, ZHANG LH, XIAO L, JIANG KL, FAN SS
ACS APPLIED MATERIALS INTERFACES
ARIA AI, NAKANISHI K, XIAO L, BRAEUNINGERWEIMER P, SAGADE AA, ALEXANDERWEBBER JA, HOFMANN S
ACS PHOTONICS
DEGL INNOCENTI R, XIAO L, JESSOP DS, KINDNESS SJ, REN Y, LIN HY, ZEITLER JA, ALEXANDERWEBBER JA, JOYCE HJ, BRAEUNINGERWEIMER P, HOFMANN S, BEERE HE, RITCHIE DA
ACS APPLIED MATERIALS INTERFACES
YANG Y, ZHANG T, WANG XC, CHEN LF, WU N, LIU W, LU HL, XIAO L, FU L, ZHUANG L
ACS PHOTONICS
DEGL INNOCENTI R, JESSOP DS, SOL CWO, XIAO L, KINDNESS SJ, LIN HY, ZEITLER JA, BRAEUNINGERWEIMER P, HOFMANN S, REN Y, KAMBOJ VS, GRIFFITHS JP, BEERE HE, RITCHIE DA
APPLIED PHYSICS LETTERS
JESSOP DS, KINDNESS SJ, XIAO L, BRAEUNINGERWEIMER P, LIN H, REN Y, REN CX, HOFMANN S, ZEITLER JA, BEERE HE, RITCHIE DA, DEGL INNOCENTI R
ACS PHOTONICS
DEGL INNOCENTI R, JESSOP DS, SOL CWO, XIAO L, KINDNESS SJ, LIN HY, ZEITLER JA, BRAEUNINGERWEIMER P, HOFMANN S, REN Y, KAMBOJ VS, GRIFFITHS JP, BEERE HE, RITCHIE DA
JOURNAL OF PHYSICAL CHEMISTRY C
ARIA AI, KIDAMBI PR, WEATHERUP RS, XIAO L, WILLIAMS JA, HOFMANN S
JOURNAL OF NANOMATERIALS
CHEN H, XIAO L, XU Y, ZENG X, YE ZB