国家/地区 Germany（3）
关键词
出版物
出版时间
机构 IHP（3）
作者 COSTINA I（3）

Processing and integration of graphene in a 200 mm wafer Si technology environment

MICROELECTRONIC ENGINEERING

LISKER M, LUKOSIUS M, FRASCHKE M, KITZMANN J, DABROWSKI J, FURSENKO O, KULSE P, SCHULZ K, KRUGER A, DREWS J, SCHULZE S, WOLANSKY D, SCHUBERT AM, KATZER J, STOLAREK D, COSTINA I, WOLFF A, DZIALLAS G, COCCETTI F, MAI A

Graphene Synthesis and Processing on Ge Substrates

ECS JOURNAL OF SOLID STATE SCIENCE TECHNOLOGY

LUPINA G, LUKOSIUS M, LIPPERT G, DABROWSKI J, KITZMANN J, LISKER M, KULSE P, KRUGER A, FURSENKO O, COSTINA I, TRUSCH A, YAMAMOTO Y, WOLFF A, SCHROEDER T, MAI A

Residual Metallic Contamination of Transferred Chemical Vapor Deposited Graphene

ACS NANO

LUPINA G, KITZMANN J, COSTINA I, LUKOSIUS M, WENGER C, WOLFF A, VAZIRI S, OSTLING M, PASTERNAK I, KRAJEWSKA A, STRUPINSKI W, KATARIA S, GAHOI A, LEMME MC, RUHL G, ZOTH G, LUXENHOFER O, MEHR W