国家/地区 Switzerland(49)
关键词 GRAPHENE(11) BILAYER GRAPHENE(3) QUANTUM DOT(3)
DYE SENSITIZED SOLA.(2) ELECTROCHEMICAL IMP.(2) LANDAU LEVEL(2)
PHOTODETECTOR(2) QUANTUM LATTICE BOL.(2) SINGLE ELECTRON TRA.(2)
出版物 NANO LETTERS(7) PHYSICAL REVIEW LET.(6) APPLIED PHYSICS LET.(4)
ACS APPLIED MATERIA.(2) JOURNAL OF MATERIAL.(2) PHYSICA STATUS SOLI.(2)
PHYSICAL REVIEW B(2) SMALL(2)
出版时间 2019(11) 2018(10) 2020(7) 2016(6) 2012(4) 2013(3) 2007(2) 2009(2) 2010(2) 2011(2) 2015(2)
机构 SWISS FED INST TECHNOL(52)
作者 ENSSLIN K(24) IHN T(20) EICH M(10) RICKHAUS P(10)
TANIGUCHI T(10) KURZMANN A(8) LEE Y(8) OVERWEG H(8)
WATANABE K(8) PISONI R(7) SIMONET P(7) STAMPFER C(6)
POULIKAKOS D(5) BISCHOFF D(4) MOLITOR F(4) VARLET A(4)
HERRMANN HJ(3) JACOBSEN A(3) LADO JL(3) LIU MH(3)

PHYSICAL REVIEW LETTERS

DE VRIES FK, ZHU JH, PORTOLES E, ZHENG GL, MASSERONI M, KURZMANN A, TANIGUCHI T, WATANABE K, MACDONALD AH, ENSSLIN K, IHN T, RICKHAUS P

ACS APPLIED MATERIALS INTERFACES

SCHLICHTING KP, POULIKAKOS D

NANOSCALE

NETKUEAKUL W, KOREJWO D, HAMMER T, CHORTAREA S, RUPPER P, BRAUN O, CALAME M, ROTHENRUTISHAUSER B, BUERKITHURNHERR T, WICK P, WANG J

PHYSICAL REVIEW LETTERS

LEE Y, KNOTHE A, OVERWEG H, EICH M, GOLD C, KURZMANN A, KLASOVIKA V, TANIGUCHI T, WANTANABE K, FAL KO V, IHN T, ENSSLIN K, RICKHAUS P

SCIENCE ADVANCES

RICKHAUS P, LIU MH, KURPAS M, KURZMANN A, LEE Y, OVERWEG H, EICH M, PISONI R, TAMAGUCHI T, WANTANABE K, RICHTER K, ENSSLIN K, IHN T

NANO LETTERS

RICKHAUS P, ZHENG GL, LADO JL, LEE Y, KURZMANN A, EICH M, PISONI R, TONG CY, GARREIS R, GOLD C, MASSERONI M, TANIGUCHI T, WANTANABE K, IHN T, ENSSLIN K

INTERNATIONAL JOURNAL OF MODERN PHYSICS C

FLOURIS K, JIMENEZ MM, HERRMANN HJ