国家/地区 Japan（2）
关键词
出版物 JAPANESE JOURNAL OF APPLIED PHYSICS（2）
出版时间 2013（2）
机构 TOKYO INST TECHNOL（2）
作者

Fluorination of Graphene by Reactive Ion Etching System Using Ar/ F-2 Plasma

JAPANESE JOURNAL OF APPLIED PHYSICS

MATSUTANI A, TAHARA K, IWASAKI T, HATANO M

Experimental Study of Two-Terminal Resistive Random Access Memory Realized in Mono- and Multilayer Exfoliated Graphene Nanoribbons

JAPANESE JOURNAL OF APPLIED PHYSICS

SHINDOME A, DOIOKA Y, BEPPU N, ODA S, UCHIDA K