JOURNAL OF APPLIED PHYSICS
WEN H, ZHU TC, LUO YQ, AMAMOU W, KAWAKAMI RK
JOURNAL OF VACUUM SCIENCE TECHNOLOGY B
SWARTZ AG, MCCREARY KM, HAN W, WONG JJI, ODENTHAL PM, WEN H, CHEN JR, KAWAKAMI RK, HAO YF, RUOFF RS, FABIAN J
PHYSICAL REVIEW B
BANISHEV AA, WEN H, XU J, KAWAKAMI RK, KLIMCHITSKAYA GL, MOSTEPANENKO VM, MOHIDEEN U
PHYSICAL REVIEW B
SWARTZ AG, CHEN JR, MCCREARY KM, ODENTHAL PM, HAN W, KAWAKAMI RK
PHYSICAL REVIEW LETTERS
MCCREARY KM, SWARTZ AG, HAN W, FABIAN J, KAWAKAMI RK
ACS NANO
SWARTZ AG, ODENTHAL PM, HAO YF, RUOFF RS, KAWAKAMI RK
NANO LETTERS
HAN W, CHEN JR, WANG DQ, MCCREARY KM, WEN H, SWARTZ AG, SHI J, KAWAKAMI RK
JOURNAL OF MAGNETISM MAGNETIC MATERIALS
HAN W, MCCREARY KM, PI K, WANG WH, LI Y, WEN H, CHEN JR, KAWAKAMI RK
PHYSICAL REVIEW LETTERS
HAN W, KAWAKAMI RK
APPLIED PHYSICS LETTERS
MCCREARY KM, PI K, KAWAKAMI RK