国家/地区 Sweden（2）
关键词
出版物 JOURNAL OF VACUUM SCIENCE TECHNOLOGY A（3）
出版时间
机构 LINKOPING UN.（2）
作者 XIA C（3）

HfO2 dielectric film growth directly on graphene by H2O-based atomic layer deposition

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

ZHENG L, CHENG XH, CAO D, WANG ZJ, XU DW, XIA C, SHEN LY, YU YH

Ytterbium oxide formation at the graphene-SiC interface studied by photoemission

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

WATCHARINYANON S, JOHANSSON LI, XIA C, VIROJANADARA C

Li induced effects in the core level and pi-band electronic structure of graphene grown on C-face SiC

JOURNAL OF VACUUM SCIENCE TECHNOLOGY A

JOHANSSON LI, XIA C, VIROJANADARA C