国家/地区 Germany（2）
关键词
出版物 SCIENTIFIC REPORTS（3）
出版时间 2021（2）
机构
作者 FRASCHKE M（3）

Perfluorodecyltrichlorosilane-based seed-layer for improved chemical vapour deposition of ultrathin hafnium dioxide films on graphene

SCIENTIFIC REPORTS

KITZMANN J, GORITZ A, FRASCHKE M, LUKOSIUS M, WENGER C, WOLFF A, LUPINA G

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M

Influence of plasma treatment on SiO2/Si and Si3N4/Si substrates for large-scale transfer of graphene (vol 11, 13111, 2021)

SCIENTIFIC REPORTS

LUKOSE R, LISKER M, AKHTAR F, FRASCHKE M, GRABOLLA T, MAI A, LUKOSIUS M