国家/地区 世界知识产权组织（6）
IPC部 C（5） H（4） B（2）
IPC大类 C01（4） H01（4） C07（2）
IPC小类 C01B（4） C07C（2） H01G（2）
H01L（2）
IPC C01B031/04（4） C01B031/02（3） C01B031/00（2）
C07C025/22（2） H01L051/50（2）
发明人 FENG X（4） MUELLEN K（4） MULLEN K（3）
SCHWAB M G（3） CAI J（2） FASEL R（2）
HINTERMANN T（2） RUFFIEUX P（2） TSAI J（2）
公开年 2014（6）
申请年 2013（5） 
专利权人 BASF SE（6）

Edge-halogenation of graphene material used for electronic/optical/optoelectronic device involves reacting graphene material e.g. graphene, graphene nanoribbon, and/or graphene molecule with halogen-donor compound in presence of Lewis acid.

HINTERMANN T, MUELLEN K, FENG X, TAN Y, MULLEN K, TAN Y Z

Forming supercapacitor involves preparing graphene film on substrate; preparing in-plane graphene electrodes of interdigital structure and current collector of interdigital structure; and adding an electrolyte in contact with the electrodes.

SCHWAB M G, MUELLEN K, FENG X, WU Z, MULLEN K

New oligophenylene monomer useful in polymeric precursor for preparing graphene nanoribbons that used are in thin film semiconductor of electronic, optical, or optoelectronic device e.g. organic field effect transistor device.

MUELLEN K, FENG X, CAI J, RUFFIEUX P, FASEL R, NARITA A, TSAI J, MULLEN K, MILLEN K

Screen-printable ink for composite material used for electrode in capacitor used for gas sensor applications comprises nano graphene platelets, polymer containing aniline monomeric units, and solvent.

XU Y, SCHWAB M G, HENNIG I

Preparing graphene nanoribbons involves providing aromatic monomer compound, e.g. polycyclic aromatic monomer, on a solid substrate, polymerization of the aromatic monomer compound, at least partially cyclodehydrogenating.

HINTERMANN T, FASEL R, RUFFIEUX P, JINMING C, SANCHEZ VALENCIA J R, CAI J, VALENCIA J R S, SANCHEZ V J R, SANCHEZ V J, TSAI J

Nitrogen-doped graphene useful for producing an aerogel, an electrode, a battery, a supercapacitor, preferably an all solid state supercapacitor, or a catalyst, preferably an electrocatalyst for oxygen reduction reactions.

SCHWAB M G, MUELLEN K, XINLIANG F, PARVEZ K, FENG X