国家/地区 中国（2）
IPC部 H（2）
IPC大类 H01（2）
IPC小类 H01L（2）
IPC
发明人 HAM M（2）
公开年
申请年
专利权人 GWANGJU INST.（2）

Formation of metal-graphene hetero-junction metal interconnect for semiconductor device, involves depositing carbon source on substrate, depositing metal catalyst layer on carbon source layer, and heat treating substrate to form graphene.

HAM M, SON M, HAM M H, MYUNGWOO S, XIAN W, SUN M

Method for synthesizing multi-layer graphene e.g. trilayer graphene, involves heat-treating catalytic metal layer on substrate while supplying methane gas, and synthesizing multi-layer graphene on heat-treated catalytic metal layer.

HAM M, SON M, HAM M H, SON M W, XIAN W, SUN M