国家/地区 中国（2）
IPC部 H（2）
IPC大类
IPC小类
IPC
发明人 LIU B（2）
公开年
申请年
专利权人

Method of making a pellicle for use in extreme ultraviolet (EUV) lithography system, by depositing graphene layer over first material layer, and depositing amorphous silicon layer over graphene layer.

TU C, CHEN C, YOO C S, CHANG J, TSAI C, LIU P, LEE H, LIN C, LIN Y, TU Z, CHEN J, CAI J, YOU Q, ZHANG Z, LIN Z, LIU B, LI X, YOO C

Natural graphite/copper composite heat sink, has copper foil layer formed on graphite layer, copper substrate formed with roughening layer, and nodule copper grain structure formed with graphene layer.

LIU B