国家/地区 中国（2）
IPC部 H（2）
IPC大类
IPC小类
IPC
发明人 LUO X（2）
公开年
申请年 2022（2） 
专利权人 CHINESE ACAD SCI OPTICS ELECTRONICS IN（2）

Wave-absorbing material based on shape memory alloy dynamic regulation useful for preparing graphene, comprises sub-wavelength structure absorbing layer set in dielectric material and graphene capacitance layer regulates equivalent square resistance of graphene capacitance layer by applying voltage.

SHE Y, JI C, HUANG C, PENG J, LUO X

Method for preparing super-resolution photo etching structure involves sequentially depositing metal layer on silicon-containing anti-reflection coating, and coating photosensitive layer to obtain super-resistance photoetch structure.

ZHAO Z, MU S, LIU K, LUO Y, GU Y, LUO X