国家/地区 韩国（2）
IPC部 H（2）
IPC大类 H01（2）
IPC小类
IPC
发明人 NAM K S（2）
公开年 2017（2）
申请年
专利权人

Blank mask used for preparing multi-electron beam lithography photomask, has heat-radiating film that is provided on transparent substrate and is composed of carbon compound including graphene or boron carbide, or silicon compound.

NAM K S, SHIN C, LEE J H, YANG C K

Nano porous three dimensional graphene for preparing gas separating membrane used in supercapacitor, is prepared heating metal oxide solution and reacting with ion exchanged water.

HAHM M G, CHO B, KIM D H, PARK S G, NAM K S