国家/地区 中国（2）
IPC部 G（2）
IPC大类
IPC小类
IPC
发明人 NIU Y（2）
公开年 2023（2）
申请年 2023（2）
专利权人 UNIV NORTH C.（2）

Preparation graphene of microstructure involves spin coating SU-8 photoresist on surface of silicon chip by spin coater, and preparing patterned SU-eight photoresists microstructure by using photo-etching technique and electron beam irradiation.

ZHOU S, NIU Y, CHOU X, BI K, LI Q, MEI L

Flexible terahertz wave absorber with multi-layer superposition of graphene or medium, has seven-layer structure, polyimodes film layer is a spin-coated agglomerant, and graphene film layer is single-layer graphene.

MU J, BI K, CHOU X, ZHANG S, HOU L, LI Q, NIU Y, MEI L