国家/地区 韩国（2）
IPC部 C（2）
IPC大类 C01（2）
IPC小类 C01B（2）
IPC C01B032/156（2）
发明人 KIM J（2）
公开年 2022（2）
申请年
专利权人

Manufacture of functional graphene used in semiconductor device, involves mixing carbon-based material, acid comprising amine group and carboxyl group, acetic acid and solvent, raising temperature and stirring, and cooling resultant of stirring.

KIM J, SONG J

Hydrophilic modification of surface useful for carbon-based material comprises irradiating ions of high energy inert gas to surface of carbon-based material.

LEE E J, KIM J, GONG Y B